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EUV-4-LITHO

Spectroscopy and analysis of components for EUV lithography and EUV mask inspection

Subject of research

  • Generation of extreme ultraviolet (EUV) radiation at 13.5 nm wavelength for metrology purposes
  • Development of a measurement method for determining the layer thickness of multilayer mirrors
  • Spectroscopy of EUV sources and EUV multilayer mirrors
  • Investigation of high vacuum conditions and EUV sources

Results

  • Development of an EUV spectrometer
  • Theoretical modeling of a measurement method for EUV multilayer systems
  • Measurement of EUV multilayer mirrors

Involved institutions and contact details

Schmalkalden University of Applied Sciences
Faculty of Mechanical Engineering
Physics and Applied Laser Technology
Prof. Dr. Christian Rödel
E-Mail: c.roedel(at)hs-sm.de 
Phone: 03683 688 2101

Military University of Warsaw
Institute of Optoelectronics
Prof. Dr. Henryk Fiedorowicz

Physikalisch-Technische Bundesanstalt
EUV metrology beamline at BESSYII in Berlin
Dr. Frank Scholze

Third-party funder

Carl Zeiss Foundation (Research Start Program for newly appointed professors at HAW)

Additional information

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