EUV-4-LITHO
Spectroscopy and analysis of components for EUV lithography and EUV mask inspection
Subject of research
- Generation of extreme ultraviolet (EUV) radiation at 13.5 nm wavelength for metrology purposes
- Development of a measurement method for determining the layer thickness of multilayer mirrors
- Spectroscopy of EUV sources and EUV multilayer mirrors
- Investigation of high vacuum conditions and EUV sources
Results
- Development of an EUV spectrometer
- Theoretical modeling of a measurement method for EUV multilayer systems
- Measurement of EUV multilayer mirrors
Involved institutions and contact details
Schmalkalden University of Applied Sciences
Faculty of Mechanical Engineering
Physics and Applied Laser Technology
Prof. Dr. Christian Rödel
E-Mail: c.roedel(at)hs-sm.de
Phone: 03683 688 2101
Military University of Warsaw
Institute of Optoelectronics
Prof. Dr. Henryk Fiedorowicz
Physikalisch-Technische Bundesanstalt
EUV metrology beamline at BESSYII in Berlin
Dr. Frank Scholze
Third-party funder
Carl Zeiss Foundation (Research Start Program for newly appointed professors at HAW)
Additional information
- Duration: 10/2023 – 09/2025 (24 Months)
- Funding amount: 150.000 €
- pdf (german): EUV-4-LITHO - Spektroskopie und Analyse von Komponenten für die EUVLithografie und EUV-Maskeninspektion
